氧化鉭薄膜的制備及光學性能研究.zip
氧化鉭薄膜的制備及光學性能研究,包括開題報告，任務書，ppt，翻譯原文和譯文摘要iabstractii1 引言11.1光學薄膜的應用11.1.1光學薄膜在顯示器技術中的應用11.1.2 光學薄膜在光通訊中的應用11.1.3 光學薄膜在硅太陽能電池中的應用21.2氧化鉭薄膜研究現(xiàn)狀32實驗52.1氧化鉭薄膜制備52.1.1磁控濺射原理52.1.2氧化鉭...
該文檔為壓縮文件,包含的文件列表如下:
內(nèi)容介紹
原文檔由會員 牛奶咖啡 發(fā)布
包括開題報告，任務書，ppt，翻譯原文和譯文
摘要 I
Abstract II
1 引言 1
1.1光學薄膜的應用 1
1.1.1光學薄膜在顯示器技術中的應用 1
1.1.2 光學薄膜在光通訊中的應用 1
1.1.3 光學薄膜在硅太陽能電池中的應用 2
1.2氧化鉭薄膜研究現(xiàn)狀 3
2實驗 5
2.1氧化鉭薄膜制備 5
2.1.1磁控濺射原理 5
2.1.2氧化鉭薄膜制備 7
2.2氧化鉭薄膜光學性能測試 8
2.2.1 橢圓偏振測量 8
2.2.2分光光度計檢測薄膜透過率 9
3實驗結果與討論 10
3.1氧化薄膜的沉積速率與工藝條件的關系 10
3.2氧化鉭薄膜光學性能的研究 11
3.2.1 氧化鉭薄膜折射率和光學帶隙 11
3.2.2濺射功率對薄膜透光率的影響 14
4、結論 16
參考文獻 17
致謝 19
氧化鉭薄膜的制備及光學性能研究
摘要
如今光學薄膜已經(jīng)被廣泛研究并應用于光纖通信、航空航天以及軍事等諸多領域，如光學集成電路與光學微機械電子系統(tǒng)、表面光學處理模塊與器件等作為動態(tài)隨機存儲(DRAM)、金屬氧化硅晶體管、減反膜、高溫阻抗、氣敏傳感器、以及電容器的關鍵材料等。Ta2O5薄膜具有很多優(yōu)良的光學性能，如在可見光范圍有較大折射率(n=2.2 at 633 nm)、較小的消光系數(shù)，是一種性能優(yōu)異的光學薄膜，具有很好的應用前景。
本實驗以氧化鉭為靶材，以氧和氬的混合氣體為濺射氣體，采用磁控濺射法在三個不同的濺射功率下制備了三組氧化鉭薄膜樣品。重點研究了不同的濺射功率對薄膜的沉積速率、折射率及透光率的影響。
采用光譜橢偏儀研究了濺射功率對氧化鉭薄膜沉積速率、折射率和光學帶隙的影響，結果表明隨著濺射功率的增大，薄膜的沉積速率提高，薄膜的折射率增大，但對光學帶隙無明顯的影響。采用紫外-可見分光光度計對氧化鉭薄膜的透過率進行了分析，結果顯示氧化鉭薄膜對300~2000 nm波段的光波的透光率接近90%，且隨著濺射功率的提高，薄膜的透光率降低。
關鍵詞：五氧化二鉭薄膜；光學性能；磁控濺射；沉積速率；折射率；透光率
The study of tantalum oxide thin films and its optical properties
Abstract
Optical film has been extensively studied and applied to the optical fiber communication, aerospace and military, and many other fields, such as optical integrated circuits and optical micro-mechanical and electronic systems, surface optical processing module and device, as a key material used in dynamic randomaccess memory (DRAM), metal oxide silicon transistor, anti-reflection film, high temperature resistance, gas sensors, and capacitors. Ta2O5 film having excellent optical properties, such as in the visible range and a larger refractive index (n = 2.2 at 633 nm), the extinction coefficient is small, so it is a high performance of an optical film and have a good application prospect.
Tantalum oxide films were prepared under three different sputtering power by magnetron sputtering on glass substrates from tantalum oxide target in a mixed gas of oxygen and argon. Influence of the sputtering power on deposition rate, refractive index and light transmittance of the films was investigated.
Thickness, refractive index and optical bandgap of the tantalum oxide films with different sputtering power were analyzed by spectroscopic ellipsometry deposition. The results show that with increasing sputtering power, the deposition rate increases, and the refractive index of the film increases, but the optical bandgap has no significant change. The transmittance of tantalum oxide thin film was determined by ultraviolet-visible spectrophotometer. The results show that the transmittance of tantalum oxide film in the wavelength of 300 ~ 2000 nm is close to 90%, and with the sputtering power increasing, the transmittance of the thin film decreases due to an decrease of the film density.
Keywords：tantalum oxide film; optical properties; magnetron sputtering; deposition rate; refractive index; transmittance
摘要 I
Abstract II
1 引言 1
1.1光學薄膜的應用 1
1.1.1光學薄膜在顯示器技術中的應用 1
1.1.2 光學薄膜在光通訊中的應用 1
1.1.3 光學薄膜在硅太陽能電池中的應用 2
1.2氧化鉭薄膜研究現(xiàn)狀 3
2實驗 5
2.1氧化鉭薄膜制備 5
2.1.1磁控濺射原理 5
2.1.2氧化鉭薄膜制備 7
2.2氧化鉭薄膜光學性能測試 8
2.2.1 橢圓偏振測量 8
2.2.2分光光度計檢測薄膜透過率 9
3實驗結果與討論 10
3.1氧化薄膜的沉積速率與工藝條件的關系 10
3.2氧化鉭薄膜光學性能的研究 11
3.2.1 氧化鉭薄膜折射率和光學帶隙 11
3.2.2濺射功率對薄膜透光率的影響 14
4、結論 16
參考文獻 17
致謝 19
氧化鉭薄膜的制備及光學性能研究
摘要
如今光學薄膜已經(jīng)被廣泛研究并應用于光纖通信、航空航天以及軍事等諸多領域，如光學集成電路與光學微機械電子系統(tǒng)、表面光學處理模塊與器件等作為動態(tài)隨機存儲(DRAM)、金屬氧化硅晶體管、減反膜、高溫阻抗、氣敏傳感器、以及電容器的關鍵材料等。Ta2O5薄膜具有很多優(yōu)良的光學性能，如在可見光范圍有較大折射率(n=2.2 at 633 nm)、較小的消光系數(shù)，是一種性能優(yōu)異的光學薄膜，具有很好的應用前景。
本實驗以氧化鉭為靶材，以氧和氬的混合氣體為濺射氣體，采用磁控濺射法在三個不同的濺射功率下制備了三組氧化鉭薄膜樣品。重點研究了不同的濺射功率對薄膜的沉積速率、折射率及透光率的影響。
采用光譜橢偏儀研究了濺射功率對氧化鉭薄膜沉積速率、折射率和光學帶隙的影響，結果表明隨著濺射功率的增大，薄膜的沉積速率提高，薄膜的折射率增大，但對光學帶隙無明顯的影響。采用紫外-可見分光光度計對氧化鉭薄膜的透過率進行了分析，結果顯示氧化鉭薄膜對300~2000 nm波段的光波的透光率接近90%，且隨著濺射功率的提高，薄膜的透光率降低。
關鍵詞：五氧化二鉭薄膜；光學性能；磁控濺射；沉積速率；折射率；透光率
The study of tantalum oxide thin films and its optical properties
Abstract
Optical film has been extensively studied and applied to the optical fiber communication, aerospace and military, and many other fields, such as optical integrated circuits and optical micro-mechanical and electronic systems, surface optical processing module and device, as a key material used in dynamic randomaccess memory (DRAM), metal oxide silicon transistor, anti-reflection film, high temperature resistance, gas sensors, and capacitors. Ta2O5 film having excellent optical properties, such as in the visible range and a larger refractive index (n = 2.2 at 633 nm), the extinction coefficient is small, so it is a high performance of an optical film and have a good application prospect.
Tantalum oxide films were prepared under three different sputtering power by magnetron sputtering on glass substrates from tantalum oxide target in a mixed gas of oxygen and argon. Influence of the sputtering power on deposition rate, refractive index and light transmittance of the films was investigated.
Thickness, refractive index and optical bandgap of the tantalum oxide films with different sputtering power were analyzed by spectroscopic ellipsometry deposition. The results show that with increasing sputtering power, the deposition rate increases, and the refractive index of the film increases, but the optical bandgap has no significant change. The transmittance of tantalum oxide thin film was determined by ultraviolet-visible spectrophotometer. The results show that the transmittance of tantalum oxide film in the wavelength of 300 ~ 2000 nm is close to 90%, and with the sputtering power increasing, the transmittance of the thin film decreases due to an decrease of the film density.
Keywords：tantalum oxide film; optical properties; magnetron sputtering; deposition rate; refractive index; transmittance
